Specifications
Mask aligner: Süss MicroTEC MA6/BA6
Specifications
Mask aligner: Süss MicroTEC MA6/BA6
UV radiation with spectral lines at 365nm, 405nm and 436nm. The parallelism is achieved with an automated procedure of Wedge Error Compensation (WEC). Both top side and backside alignment is achieved with manual micrometer knobs down to a precision of about 0.5 µm. UV lamp gives 2.5-0.7 micron resolution depending on process parameters.