Jump to content
HomeResearchLaboratoriesNanolab / cleanroom

Specifications

Mask aligner: Süss MicroTEC MA6/BA6

The MA6/BA6 is designed to align and expose wafers up to 6-inch (150 mm) diameter.

Specifications

Mask aligner: Süss MicroTEC MA6/BA6

The MA6/BA6 is designed to align and expose wafers up to 6-inch (150 mm) diameter.

UV radiation with spectral lines at 365nm, 405nm and 436nm. The parallelism is achieved with an automated procedure of Wedge Error Compensation (WEC). Both top side and backside alignment is achieved with manual micrometer knobs down to a precision of about 0.5 µm. UV lamp gives 2.5-0.7 micron resolution depending on process parameters.